Iconium-P is a complete CVD system which operates under PECVD mode. Polymer depositions at very low plasma powers can be achieved. Substrates are placed on a water-cooled substrate holder. Many different types of functional polymers can be deposited at very high rates and with almost-full retention of monomer functionality.

Basic Specifications:

• Turn-key PECVD system for research labs, institutions

• 13.56 Mhz RF Plasma generator & Matching Unit (300 W) 

• Color PLC-Based Touch Screen Control Interface

• Water-circulated substrate cooling.

• Capable of housing 6-inch substrates.

• One MFC and 2 needle valves for flow control

• Capacitance vacuum gauge for pressure measurement

• PID pressure (downstream) and temperature  controls

• Rotary-vane vacuum pump 

• 5 x 10-3 torr ultimate chamber vacuum

• In-situ thickness monitoring

• Special design fume-hood

Options:

• Additional mass flow controllers & valves

• Larger chamber sizes & geometries are optional

• Temperature controlled bubbler for liquid precursors